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NYS Governor's Awards for Pollution Prevention - IBM - East Fishkill

IBM - East Fishkill, Hopewell Junction, New York

Background

IBM's East Fishkill facility develops, manufactures and tests leading-edge semiconductor packaging technologies, and develops new semiconductor products and processes. The large complex houses IBM's Interconnect Products, C4 Plating,and the Semiconductor Research and Development Center (SRDC). Other units support the location's infrastructure. There are about 6,000 employees at the facility.

As one of the largest chemical-using sites of IBM, the site must address issues of natural resource management and pollution prevention across all media. Being located in a fairly rural area without access to municipal water and wastewater systems, IBM developed its own systems.

Methodologies and Procedures

IBM's East Fishkill facility formed pollution prevention/waste minimization and energy conservation teams to investigate, implement and share pollution prevention activities at the site. Coordinated by the chemical management department, the teams are composed of representatives from the major manufacturing business units, research and development, environmental engineering, chemical management and utility plant engineering.

The pollution prevention/waste minimization teams address a variety of topics, including chemical use reduction in manufacturing processes by equipment and/or process modifications, chemical substitution, water and energy consumption, waste generation, and recycling. Similar teams address energy conservation and cost avoidance, including a Site Energy Council for energy conservation, Best Practices Teams for ideas that are deemed best of breed.

Site Operations developed two programs that successfully focused attention on waste minimization and pollution prevention:

An environmental scorecard that includes a compilation of the organization's chemical use, hazardous and nonhazardous waste generation quantity and costs, hazardous waste minimization values, domestic and deionized water usage, and wastewater generation and air emissions. Appropriate scorecard information is indexed to production.

A Direct Charging Program (DCP) whereby manufacturing and development departments are retroactively charged for costs of environmental and waste management activities in each department, providing incentive to reduce waste generation.

Benefits

Using the teams and programs described above, the East Fishkill site achieved:

A Hazardous Air Pollutants (HAPs) reduction project, resulting in a perchloroethylene (PCE) emission reduction of 22 tons/year; to less than 0.2 tons/year. PCE was eliminated from manufacturing operations by chemical substitution with an aqueous cleaner. Other air emissions were reduced by installation of regenerative thermal oxidizers (RTOs).

Water conservation projects that resulted in a 20.3 percent water use reduction in 1999 (compared to 1998). This was done by reconfiguring the reverse osmosis system that produces deionized water. The efficiency was increased from 75 to 85 percent by sending part of the rejected water to be reprocessed with other feed water.

A significant exceedance of hazardous waste minimization objectives with hazardous waste minimization levels of 15.0% - 34.3 percent during the years from 1997 to 2000.

Energy conservation and cost avoidance levels of 6.6 - 28.2 percent during the years from 1997 to 2000. Future energy savings will come from a performance-contracting program. In performance contacting, the design, engineering and construction of energy savings projects are borne by the contractor, who receives part of the cost savings. Example topics include lighting retrofits, HVAC upgrades, high-efficiency motor replacements, variable frequency drive installations, and control system upgrades.

A state-of-the-art expansion to a fluoride/heavy metal wastewater treatment system that more effectively treats heavy metal wastewaters. The new ultrafiltration treatment process generates 75 percent less sludge than the existing process.

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This page was last modified September 25, 2002


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